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Specific Process Knowledge/Lithography/Resist/UVresist: Difference between revisions

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Jehem (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, danchip
1,890 edits
Jehem (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, danchip
1,890 edits
Line 454: Line 454:
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
!AZ MiR 701
!AZ MiR 701
| 2023-04-05<br>jehem
| 2023-07-06<br>jehem
| 1.5 µm
| 1.5 µm
| Fast
| Fast
| 305 mJ/cm<sup>2</sup>
| 275 mJ/cm<sup>2</sup>
| 0
| 1
| 1.25 µm<br>Tested using dehydration reducing measures
| 1 µm<br>Tested using dehydration reducing measures
| PEB: 60s@110°C<br>Dev: SP60s
| PEB: 60s@110°C<br>Dev: SP60s
|-
|-
Line 466: Line 466:
|-style="background:silver; color:black"
|-style="background:silver; color:black"
!AZ nLOF 2020
!AZ nLOF 2020
| 2023-04-04<br>jehem
| 2023-07-06<br>jehem
| 2.0 µm
| 2.0 µm
| Fast
| Fast
| 160 mJ/cm<sup>2</sup>
| 180 mJ/cm<sup>2</sup>
| -3
| 0
| 1.5 µm
| 1.5 µm
| PEB: 60s@110°C<br>Dev: SP60s
| PEB: 60s@110°C<br>Dev: SP60s
Line 478: Line 478:
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
!AZ 5214E
!AZ 5214E
| 2023-04-05<br>jehem
| 2023-07-06<br>jehem
| 1.5 µm
| 1.5 µm
| Fast
| Fast
| 120 mJ/cm<sup>2</sup>
| 110 mJ/cm<sup>2</sup>
| -3
| 0
| 2.0 µm
| 1.75 µm
| Dev: SP60s
| Dev: SP60s
|-
|-
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