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Specific Process Knowledge/Lithography/EBeamLithography/JEOLJobPreparation: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
2,179 edits
Thope (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
2,179 edits
Line 338: Line 338:
ACC 100
ACC 100
CALPRM '6na_ap5'
CALPRM '6na_ap5'
DEFMODE 2      ;2_stage deflection
DEFMODE 2       
GLMDET S
GLMDET S
CHIPAL 1
CHIPAL 1
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