Specific Process Knowledge/Lithography/EBeamLithography/JEOLJobPreparation: Difference between revisions
| Line 233: | Line 233: | ||
===Global alignment SDF=== | ===Global alignment SDF=== | ||
<pre> | <pre> | ||
MAGAZIN ' | MAGAZIN 'ELELOP' | ||
#8 | #8 | ||
% 4A | % 4A | ||
JDF ' | JDF 'elelop230401',1 | ||
ACC 100 | ACC 100 | ||
CALPRM '6na_ap5' | CALPRM '6na_ap5' | ||
| Line 244: | Line 244: | ||
GLMDET A | GLMDET A | ||
CHIPAL 0 | CHIPAL 0 | ||
HSWITCH OFF, | HSWITCH OFF,ON | ||
RESIST 152 | RESIST 152 | ||