Specific Process Knowledge/Lithography/EBeamLithography/JEOLJobPreparation: Difference between revisions
Appearance
| Line 252: | Line 252: | ||
</pre> | </pre> | ||
Compared to the first print exposure the SDF file has three extra commands, '''GLMDET''', '''CHIPAL''' and '''HSWITCH'''. | Compared to the first print exposure the SDF file has three extra commands, '''GLMDET''', '''CHIPAL''' and '''HSWITCH'''. Additionally, the '''OFFSET''' command serves a somewhat different purpose now as explained below. | ||
==Global alignment - JDF== | ==Global alignment - JDF== | ||