Specific Process Knowledge/Lithography/EBeamLithography/JEOLJobPreparation: Difference between revisions
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=Alignment exposure= | =Alignment exposure - direct exposure mode= | ||
==Schedule file== | ==Schedule file== | ||
==Jobdeck file== | ==Jobdeck file== | ||
=Beam pitch, beam current and exposure dose relationship= | =Beam pitch, beam current and exposure dose relationship= | ||