Specific Process Knowledge/Lithography/EBeamLithography/EBLsubstratePrep: Difference between revisions

Revision as of 15:27, 17 April 2023 view source Thope (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231 2,179 edits →Resist coating ← Older edit		Revision as of 15:28, 17 April 2023 view source Thope (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231 2,179 edits →Resist coating Newer edit →
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	We recommend all groups or users to have their own bottle of e-beam resist inside the cleanroom. Please follow the [[Specific Process Knowledge/Lithography/EBeamLithography/ResistBottles\|user resist bottles in the cleanroom guide.]]		We recommend all groups or users to have their own bottle of e-beam resist inside the cleanroom. Please follow the [[Specific Process Knowledge/Lithography/EBeamLithography/ResistBottles\|user resist bottles in the cleanroom guide.]]


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