Specific Process Knowledge/Lithography/EBeamLithography/JEOLPatternPreparation: Difference between revisions

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Pattern placement on the JEOL system has a very important difference regarding patttern placement compared to our Heidelberg MLA systems. Pattern placement is entirely dependent on the boundary box of the design. All patterns are placed using the '''ARRAY''' command and they are placed with respect to the center of the design boundary box. This is illustrated below with the two designs, L1 and L2. L1 is a design nicely centered around (0,0) with a symmetric bounding box. When placed by the '''ARRAY''' command at (0,0) this will come out entirely as expected. L2 does however not have a bounding box centered around (0,0) and when placed by the '''ARRAY''' command at (0,0), it will be exposed at the center of the substrate. Thus, it is vital to keep the bounding box in mind as the '''ARRAY command places patterns with respect to the center of the bounding box.''' This is in stark contrast to how the MLA UV lithography systems work and it is often essential to intentionally control the bounding box of a pattern. To get the desired result in this example, one can define an appropriate offset in the '''ARRAY''' command for exposure of L2.