Specific Process Knowledge/Lithography/EBeamLithography/JEOLJobPreparation: Difference between revisions
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'''RESIST [dose]''' | '''RESIST [dose]''' | ||
This determines the exposure dose in units of µC/cm2. In the example a dose of 240 µC/cm2 is used. In many cases it can be necessary to perform a dose test to get the optimum result. A dose test can be set up in several ways, please consult with the dose testing section in Labmanager. | This determines the exposure dose in units of µC/cm2. The beam dwell time is automatically adjusted to achieve this area dose based on the latest beam current measurement. In the example a dose of 240 µC/cm2 is used. In many cases it can be necessary to perform a dose test to get the optimum result. A dose test can be set up in several ways, please consult with the dose testing section in Labmanager. | ||
'''SHOT A,[number]''' | '''SHOT A,[number]''' | ||