Specific Process Knowledge/Lithography/EBeamLithography/JEOLJobPreparation: Difference between revisions
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= Introduction = | |||
In order to write a pattern with the e-beam system you will have to generate a set of job files. These files are essentially a set of instructions which tell the system what pattern to write, where to place each pattern along with specific writing conditions, exposure dose, alignment conditions and calibration conditions. Apart from this you will naturally also have to generate the pattern you wish to expose. | In order to write a pattern with the e-beam system you will have to generate a set of job files. These files are essentially a set of instructions which tell the system what pattern to write, where to place each pattern along with specific writing conditions, exposure dose, alignment conditions and calibration conditions. Apart from this you will naturally also have to generate the pattern you wish to expose. | ||
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At DTU Nanolab it is a strict requirement that all job files are prepared ahead of an exposure session. The JEOL 9500 system is a valuable resource and users must always show up well prepared not to waste tool time on file preparation. '''Users who squander valuable tool time away due to poor preparation will lose access to the tool.''' | At DTU Nanolab it is a strict requirement that all job files are prepared ahead of an exposure session. The JEOL 9500 system is a valuable resource and users must always show up well prepared not to waste tool time on file preparation. '''Users who squander valuable tool time away due to poor preparation will lose access to the tool.''' | ||
= JEOL 9500 file types and generalized flow = | |||
[[File:MGN3.png|500px|thumb|right|Generalized job flow.]] | [[File:MGN3.png|500px|thumb|right|Generalized job flow.]] | ||
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In the following we will discuss details of the most commonly used commands in the SDF and JDF and provide example files for various types of jobs. We will start with a simple exposure without pattern alignment, i.e. a first print exposure. In JEOL terminology this is called “mask exposure mode” whereas exposure with alignment is refered to as “direct exposure mode”. | In the following we will discuss details of the most commonly used commands in the SDF and JDF and provide example files for various types of jobs. We will start with a simple exposure without pattern alignment, i.e. a first print exposure. In JEOL terminology this is called “mask exposure mode” whereas exposure with alignment is refered to as “direct exposure mode”. | ||
=First print / mask exposure mode= | |||
== Schedule File == | |||
A simple example of a SDF is shown below. It has a single sequence and hence it will expose a single substrate. A detailed description of the commands is given below. Comments can be added using semicolon, as illustrated in the first line. | A simple example of a SDF is shown below. It has a single sequence and hence it will expose a single substrate. A detailed description of the commands is given below. Comments can be added using semicolon, as illustrated in the first line. | ||