Specific Process Knowledge/Lithography/Resist/UVresist: Difference between revisions
| Line 788: | Line 788: | ||
|- | |- | ||
|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
!rowspan="3"|AZ 5214E | !rowspan="3"|AZ 5214E<br><span style="color:red">Old German version</span> | ||
|Long ago | |Long ago | ||
|1.5 µm | |1.5 µm | ||
| Line 808: | Line 808: | ||
|- | |- | ||
|-style="background:LightGrey; color:black" | |-style="background:LightGrey; color:black" | ||
!rowspan="2"|AZ 5214E | !rowspan="2"|AZ 5214E<br><span style="color:red">Old German version</span> | ||
|Long ago | |Long ago | ||
|1.5 µm | |1.5 µm | ||
| Line 825: | Line 825: | ||
|- | |- | ||
|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
!AZ 4562 | !AZ 4562<br><span style="color:red">Old German version</span> | ||
|Long ago | |Long ago | ||
|10 µm | |10 µm | ||