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Specific Process Knowledge/Lithography/Resist/UVresist: Difference between revisions

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Jehem (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, danchip
1,931 edits
Jehem (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, danchip
1,931 edits
Line 545: Line 545:
|-style="background:whitesmoke; color:black"
|-style="background:whitesmoke; color:black"
!AZ 4562
!AZ 4562
| Not tested yet
| 2023-04-04<br>jehem
| 10 µm
| 10 µm
| Fast
| Fast
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