Jump to content

Specific Process Knowledge/Lithography/Resist/UVresist: Difference between revisions

← Older editNewer edit →
VisualWikitext
Jehem (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, danchip
1,871 edits
Jehem (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, danchip
1,871 edits
Line 532: Line 532:
|-
|-
|-style="background:silver; color:black"
|-style="background:silver; color:black"
!AZ 5214E image reversal
!AZ 5214E<br>image reversal
| 2023-04-04
| 2023-04-04
| 2.2 µm
| 2.2 µm
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Lithography/Resist/UVresist"