Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 03 processing: Difference between revisions
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==Advanced Field alignment (TSA)== | ==Advanced Field alignment (TSA)== | ||
'''Overlay accuracy (spec):''' 0. | '''Overlay accuracy (spec):''' 0.25 µm (5x5 mm<sup>2</sup> area) | ||
Shift, rotation, scaling, and shearing is determined and set by global alignment marks. The shift is corrected by automatic alignment to one mark in each field (chip). | Shift, rotation, scaling, and shearing is determined and set by global alignment marks. The shift is corrected by automatic alignment to one mark in each field (chip). | ||
| Line 264: | Line 264: | ||
(Jehem Feb 2020) | (Jehem Feb 2020) | ||
|'''X''' | |'''X''' | ||
| | | 100 ±55 | ||
| | | 106 ±55 | ||
|- | |- | ||
|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
|'''Y''' | |'''Y''' | ||
| | | 100 ±56 | ||
| | | 104 ±56 | ||
|} | |} | ||
<br clear="all" /> | <br clear="all" /> | ||