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Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 03 processing: Difference between revisions

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==Back Side Alignment==
==Back Side Alignment==


[[Image:MLA150_BSA_Backside.JPG|300x300px|thumb|Image of a BSA alignment mark during alignment. The mark is 300µm wide. The blue cross-hair is ~18µm. Screenshot by Thomas Anhøj @ DTU Nanolab, 2019.]]
'''Overlay accuracy (spec):''' 1.0 µm


'''Overlay accuracy (spec):''' 1.0µm
'''BSA windows:''' along the X and Y axes, 10mm x 46mm, starting 14.5 mm from the center.


'''BSA windows:''' along the X and Y axes, 10mm x 46mm, starting 14.5mm from the center.
'''Camera field of view (W x H):''' 640 µm x 480 µm
 
[[Image:MLA150_BSA_Backside.JPG|center|300px|thumb|Image of a BSA alignment mark during alignment. The mark is 300µm wide. The blue cross-hair is ~18µm. Screenshot by Thomas Anhøj @ DTU Nanolab, 2019.]]


'''Camera field of view (W x H):''' 640µm x 480µm


The alignment marks must be placed within the BSA windows. The Overview camera only shows the top side of the substrate, and cannot be used to locate the BSA marks.
The alignment marks must be placed within the BSA windows. The Overview camera only shows the top side of the substrate, and cannot be used to locate the BSA marks.


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|+'''Substrate view during backside alignment. Screenshots by Thomas Anhøj @ DTU Nanolab, 2019.'''
|+'''Substrate view during backside alignment. Screenshots by Thomas Anhøj @ DTU Nanolab, 2019.'''