Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 03 processing: Difference between revisions
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Quality mode is used for optimal resolution, best overlay accuracy, and minimum stripe stitching effects.<br> | Quality mode is used for optimal resolution, best overlay accuracy, and minimum stripe stitching effects.<br> | ||
In the high quality mode, an area of the pattern is exposed by 5 stripes, each | In the high quality mode, an area of the pattern is exposed by 5 stripes, each 500 µm wide and exposing a fifth of the dose. At the same time, sub-pixel interpolation is applied, yielding an address grid size of 100 nm. | ||
'''Fast:''' | '''Fast:''' | ||
Fast mode is used for maximum exposure speed.<br> | Fast mode is used for maximum exposure speed.<br> | ||
In the fast mode, each area of the pattern is exposed by 2 stripes only. This reduces the exposure time by 60%, but also increases the size of the address grid in the | In the fast mode, each area of the pattern is exposed by 2 stripes only. This reduces the exposure time by 60%, but also increases the size of the address grid in the x-direction to 250 nm. This means that alignment will be less accurate in fast mode. Due to less averaging of non-uniformities, stitching effects will be more prominent in this mode. | ||
==Writing speed== | ==Writing speed== | ||