Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 02 processing: Difference between revisions
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Aligner: Maskless 02 offers two exposure modes. The exposure mode is selected during design conversion. | Aligner: Maskless 02 offers two exposure modes. The exposure mode is selected during design conversion. | ||
'''High quality:''' | '''High quality:''' | ||
High quality mode is used for minimum stitching effects.<br> | High quality mode is used for minimum stitching effects.<br> | ||
In the high quality mode, an area of the pattern is exposed by 5 stripes, each 500µm wide and exposing a fifth of the dose. At the same time, sub-pixel interpolation is applied, giving an address grid size of 100 nm. | In the high quality mode, an area of the pattern is exposed by 5 stripes, each 500µm wide and exposing a fifth of the dose. At the same time, sub-pixel interpolation is applied, giving an address grid size of 100 nm. | ||
'''Fast:''' | '''Fast:''' | ||
Fast mode is used for maximum exposure speed.<br> | Fast mode is used for maximum exposure speed.<br> | ||
In the fast mode, each area of the pattern is exposed by 2 stripes only. This effectively cuts the exposure time by 2.5 times, but also increases the size of the address grid in the X-direction by 2.5. Due to less averaging of non-uniformities, stitching effects will be more prominent in this mode. | In the fast mode, each area of the pattern is exposed by 2 stripes only. This effectively cuts the exposure time by 2.5 times, but also increases the size of the address grid in the X-direction by 2.5. Due to less averaging of non-uniformities, stitching effects will be more prominent in this mode. | ||