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Specific Process Knowledge/Lithography/Resist/UVresist: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, danchip
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Jehem (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, danchip
1,890 edits
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|-
|-
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
!AZ MiR 701
!rowspan="2"| AZ MiR 701
| 2023-03-21<br>jehem
|rowspan="2"| 2023-03-21<br>jehem
| 1.5 µm
|rowspan="2"| 1.5 µm
| 375
|rowspan="2"| 375
| Optical
| Optical
| Quality
|rowspan="2"| Quality
| 415 mJ/cm<sup>2</sup>
|rowspan="2"| 415 mJ/cm<sup>2</sup>
| 6
| 6
| 1 µm<br>Tested using dehydration reducing measures
|rowspan="2"| 1 µm<br>Tested using dehydration reducing measures
|  
|rowspan="2"|  
PEB: 60s @ 110°C<br>
PEB: 60s @ 110°C<br>
Dev: SP60s
Dev: SP60s
|-style="background:WhiteSmoke; color:black"
| Pneumatic
| 2
|-
|-


|-
|-
|-style="background:silver; color:black"
|-style="background:silver; color:black"
!AZ nLOF 2020
!rowspan="2"| AZ nLOF 2020
| 2021-02-22<br>jehem
|rowspan="2"| 2023-03-21<br>jehem
| 2.0 µm
|rowspan="2"| 2.0 µm
| 375
|rowspan="2"| 375
| Optical
| Optical
| Quality
|rowspan="2"| Quality
| 350 mJ/cm<sup>2</sup>
|rowspan="2"| 700 mJ/cm<sup>2</sup>
| 0
| 6
| 1 µm
|rowspan="2"| 2.0 µm
| PEB: 120s@110°C, Dev: SP60s
|rowspan="2"|
PEB: 60s @ 110°C<br>
Dev: SP60s
|-style="background:silver; color:black"
| Pneumatic
| 2
|-
|-


|-
|-
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
!AZ 5214E
!rowspan="2"| AZ 5214E
| 2021-08-20<br>jehem
|rowspan="2"| 2023-03-21<br>jehem
| 1.5 µm
|rowspan="2"| 1.5 µm
| 375
|rowspan="2"| 375
| Optical
| Optical
| Fast
|rowspan="2"| Quality
| 70 mJ/cm<sup>2</sup>
|rowspan="2"| 120 mJ/cm<sup>2</sup>
| -4
| 6
| 1 µm
|rowspan="2"| 1 µm
| Dev: SP60s
|rowspan="2"| Dev: SP60s
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
| Pneumatic
| 2
|-
|-


|-
|-
|-style="background:silver; color:black"
|-style="background:silver; color:black"
!AZ 5214E image reversal
!rowspan="2"| AZ 5214E image reversal
| 2021-11-25<br>jehem
|rowspan="2"| 2023-03-21<br>jehem
| 2.2 µm
|rowspan="2"| 2.2 µm
| 375
|rowspan="2"| 375
| Optical
| Optical
| Fast
|rowspan="2"| Quality
| <s>16 mJ/cm<sup>2</sup></s>
|rowspan="2"| 45 mJ/cm<sup>2</sup>
| <s>-4</s>
| 6
| <s>1.75 µm</s>
|rowspan="2"| 1.5 µm
| Reversal bake: 60s@110°C, Flood exposure: 500mJ/cm<sup>2</sup>, Dev: SP60s  
|rowspan="2"|
Reversal bake: 60s @ 110°C<br>
Flood exposure: 500 mJ/cm<sup>2</sup><br>
Dev: SP60s  
|-style="background:silver; color:black"
| Pneumatic
| 2
|-
|-


|-
|-
|-style="background:whitesmoke; color:black"
|-style="background:whitesmoke; color:black"
!AZ 4562
!rowspan="2"| AZ 4562
| 2021-12-08<br>jehem
|rowspan="2"| Not tested yet
| 10 µm
|rowspan="2"| 10 µm
| 375
|rowspan="2"| 375
| Optical
| Optical
| Fast
|rowspan="2"| Quality
| 750 mJ/cm<sup>2</sup>
|rowspan="2"|
| 0
|  
| ≤5 µm
|rowspan="2"|
| Priming: HMDS<BR>Rehydration after SB: 1 hour (may not be necessary)<br>Exposure: Multiple exposures with pauses, 5 x (10 s exposure + 10 s pause)<br>Degassing after exposure: 1 hour (may not be necessary)<br>Development: Multiple puddles, 5 x 60 s
|rowspan="2"|
Priming: HMDS<br>
Rehydration after softbake: 1 hour (may not be necessary)<br>
Exposure: Single exposure
Degassing after exposure: 1 hour (may not be necessary)<br>
Development: Multiple puddles, 5 x 60 s
|-style="background:whitesmoke; color:black"
| Pneumatic
|
|-
|-


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