Specific Process Knowledge/Lithography/EBeamLithography/JEOL 9500 User Guide: Difference between revisions
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*The e-beam writer can pattern structures with a minimum resolution of 10 nm. | *The e-beam writer can pattern structures with a minimum resolution of 10 nm. | ||
*The maximum writing field size is 1000 µm x 1000 µm. | *The maximum writing field size is 1000 µm x 1000 µm. | ||
*The machine has cassettes | *The machine has cassettes for 2", 4", 6" and 8" wafers and also dedicated cassettes for chips with slot dimensions of 4 mm, 8 mm, 12 mm, and 20 mm. See the [[Specific Process Knowledge/Lithography/EBeamLithography/Cassettes|Cassette specification page for more information.]] | ||
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