Specific Process Knowledge/Lithography/EBeamLithography/JEOLJobPreparation: Difference between revisions
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In the following we will discuss details of the most commonly used commands in the SDF and JDF and provide example files for various types of jobs. We will start with a simple exposure without pattern alignment, i.e. a first print exposure. In JEOL terminology this is called “mask exposure mode” whereas exposure with alignment is refered to as “direct exposure mode”. | In the following we will discuss details of the most commonly used commands in the SDF and JDF and provide example files for various types of jobs. We will start with a simple exposure without pattern alignment, i.e. a first print exposure. In JEOL terminology this is called “mask exposure mode” whereas exposure with alignment is refered to as “direct exposure mode”. | ||
== Schedule File | ==First print / mask exposure mode== | ||
=== Schedule File === | |||
A simple example of a SDF is shown below. It has a single sequence and hence it will expose a single substrate. A detailed description of the commands is given below. Comments can be added using semicolon, as illustrated in the first line. | A simple example of a SDF is shown below. It has a single sequence and hence it will expose a single substrate. A detailed description of the commands is given below. Comments can be added using semicolon, as illustrated in the first line. | ||