Specific Process Knowledge/Lithography/EBeamLithography/JEOLPatternPreparation: Difference between revisions
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In addition to the V30 file a .JDI file is also generated. This contains the corresponding dose modulation table. If the design is not proximity corrected the table will be empty and is not needed. If the design is proximity corrected it is necesarry to open the JDI file and copy-paste the modulation table into the JDF file used for the exposure. | In addition to the V30 file a .JDI file is also generated. This contains the corresponding dose modulation table. If the design is not proximity corrected the table will be empty and is not needed. If the design is proximity corrected it is necesarry to open the JDI file and copy-paste the modulation table into the JDF file used for the exposure. | ||
{| class = "collapsible | {| class = "collapsible" width=65% style = "border-radius: 10px; border: 1px solid #CE002D;" | ||
! width=100% | Example JDI file after PEC | ! width=100% | Example JDI file after PEC | ||
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; PATTERN_SORTING_DIRECTION = XZIG | ; PATTERN_SORTING_DIRECTION = XZIG | ||
; PATTERN_WRITING_UNIT_TYPE = POSSET | ; PATTERN_WRITING_UNIT_TYPE = POSSET | ||
</pre> | </pre> | ||