Specific Process Knowledge/Lithography/EBeamLithography/JEOLPatternPreparation: Difference between revisions
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[[File:BeamerPEC2.png|1250px|center|frameless]] | |||
As seen above the PEC node has a lot of variables, more information can be found in the tutorials on the GenISys website, here we will only go through the most important options. | |||
From the '''General''' tab the layer(s) to perform PEC can be selected through the '''Layer(s)''' field. The type of PSF is defined from the '''PSF Representation'''. Archived PSF's can be loaded from either the local machine '''Archive...''' or from the '''Global Archive...''' (network based and thus available on both Beamer computers). Forward scatter through the resist layer is disabled by default, it can be enabled with '''Include Short Range Correction''' at the expense of (sometimes a lot) extra computation time. Known development bias can be adjusted for in '''Lateral Development Correction'''. | |||
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In the '''Accuracy''' tab one can control the accuracy and element size of fractured elements. The '''Accuracy [%]''' field defines the maximum allowable difference in dose classes and thus has an impact on the number of dose classes generated. The '''Maximum Number of Dose Classes''' sets an upper limit to this, the JEOL 9500 system allows up to 999 dose classes in a modulation table. The '''Minimum/Maximum Dose Factor''' fields are rarely used, most designs fall into a range of 0.9-3. Under '''Fracturing''' one can control the lateral precision of fractured elements the design is broken into. Beware that if a very low '''Isodose Grid''' is set a very large number of elements can be created that will make the exposure data rate limited rather than exposure rate limited, since the computer system can only feed data to the exposure system at a certain rate. The '''Minimum Figure Size''' can be used to limit how small elements may be created, this can be used to prevent corners being broken into unnecessarily small elements. | |||
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