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Specific Process Knowledge/Lithography/EBeamLithography/BEAMER: Difference between revisions

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Thope (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
2,179 edits
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'''Feedback to this page''': '''[mailto:e-beam@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php?title=Specific_Process_Knowledge/Lithography click here]'''
'''Feedback to this page''': '''[mailto:e-beam@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php?title=Specific_Process_Knowledge/Lithography click here]'''


=Introduction=
=Beamer guide=
== Electron scattering in resist and substrate ==
All users of the JEOL 9500 system must have their pattern converted to the JEOL52 V3.0 (V30) format. This is typically done using Beamer. Beamer can however do many other operations than a simple format conversion. In this section we will dive into some of the most useful functions of Beamer.


During exposure electrons will undergo scattering processes in the resist and in the substrate.
==




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