Specific Process Knowledge/Lithography/EBeamLithography/BEAMER: Difference between revisions
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=Dose test with | =Dose test with ChipPlace= | ||
A pattern can easily be set up for a dose test using the | A pattern can easily be set up for a dose test using the ChipPlace module. In ChipPlace one can set up a pattern to be instanced a number of time and easily assign each instance a dose. The dose can be manually set or be linearly interpolated between a start and end value for the instanced array. The output of ChipPlace is a single pattern file with all array elements assigned to individual doses (shot ranks). This also works with patterns that already have PEC applied. In that case ChipPlace will create a combined modulation of the PEC modulation and the dose test modulation. In the example below we demonstrate how to set up dose test without PEC. If PEC is needed a PEC node can simply be added before the ChipPlace node. In the example we will use the '''Array_dots''' pattern found in the examples pane. It is a simple array of dots in a 100 x 100 µm<sup>2</sup> box. The procedure is | ||
*Import a design | *Import a design | ||
*Add the | *Add the ChipPlace node | ||
*In the '''Substrate''' tab define the substrate size. This is purely for visualization of how the pattern fits on the substrate | *In the '''Substrate''' tab define the substrate size. This is purely for visualization of how the pattern fits on the substrate | ||
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Choose a substrate size to visualize placement within the substrate in | Choose a substrate size to visualize placement within the substrate in ChipPlace. Image: Thomas Pedersen. | ||
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*Go to the '''Array and Data tab''' | *Go to the '''Array and Data tab''' | ||
*Click '''Add Array''' | *Click '''Add Array''' | ||
*In '''Data to place''' choose '''Chip'''. It will then take the pattern connected to the | *In '''Data to place''' choose '''Chip'''. It will then take the pattern connected to the ChipPlace module | ||
*Fill in array data in '''Repitition''' and '''Pitch''' to create as many dose test instance as you want. In this case we create a 10 x 2 array | *Fill in array data in '''Repitition''' and '''Pitch''' to create as many dose test instance as you want. In this case we create a 10 x 2 array | ||
*Choose '''Center''' in '''Position Mode''' to have everything centered in the final output pattern (V30 file) | *Choose '''Center''' in '''Position Mode''' to have everything centered in the final output pattern (V30 file) | ||
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*Click '''OK''' in both open windows to see the result | *Click '''OK''' in both open windows to see the result | ||
This will produce a 10 x 2 array of the pattern with a relative dose from 1 to 2. Remember this dose is acting as a multiplier onto the base dose defined by '''RESIST''' in the SDF file. Thus if a base dose of 200 is defined by '''RESIST''' this setup will start at 200 µC/cm<sup>2</sup> and end at 400 µC/cm<sup>2</sup>. | This will produce a 10 x 2 array of the pattern with a relative dose from 1 to 2. Remember this dose factor is acting as a multiplier onto the base dose defined by '''RESIST''' in the SDF file. Thus if a base dose of 200 is defined by '''RESIST''' this setup will start at 200 µC/cm<sup>2</sup> and end at 400 µC/cm<sup>2</sup>. | ||
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To make analysis of the post exposure result easier let us add a dose label to each array element. This dose label will be exposed along with the pattern and thus when inspecting the result in SEM the dose will be visible next to the pattern. It is very easy to add: | To make analysis of the post exposure result easier let us add a dose label to each array element. This dose label will be exposed along with the pattern and thus when inspecting the result in SEM the (relative) dose will be visible next to the pattern. It is very easy to add: | ||
*Go to the '''Texts''' pane in the bottom window | *Go to the '''Texts''' pane in the bottom window | ||
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*Choose array 1 in '''Array ID''' to assign the text label to that array | *Choose array 1 in '''Array ID''' to assign the text label to that array | ||
*Assign text labels to all array elements with the '''(*,*,2)''' command. The "2" sets the relative dose of the labels to 2 | *Assign text labels to all array elements with the '''(*,*,2)''' command. The "2" sets the relative dose of the labels to 2 | ||
*Assign | *Assign an y-axis offset of for instance -100 µm to avoid having the label printed on top of the pattern itself | ||
*Assign a decent size in the '''Size''' window, 20 µm will work for most cases | *Assign a decent size in the '''Size''' window, 20 µm will work for most cases | ||
*Click '''OK''' in the bottom of the window to return to the Beamer view | *Click '''OK''' in the bottom of the window to return to the Beamer view | ||
*Run the | *Run the ChipPlace node to see the result | ||
*Add | *Add an '''Export''' node and export the result as normal | ||
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Final result of the | Final result of the ChipPlace node with relative doses from 1 to 2, ready for export to V30. Image: Thomas Pedersen. | ||
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