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Specific Process Knowledge/Lithography/EBeamLithography/BEAMER: Difference between revisions

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Thope (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
2,179 edits
Thope (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
2,179 edits
Line 246: Line 246:
{| style="border: none; border-spacing: 0; margin: 1em auto; text-align: center;"
{| style="border: none; border-spacing: 0; margin: 1em auto; text-align: center;"
|-
|-
| [[image:BEAMER_5.png|600px]] || [[image:BEAMER_6.png|600px]]
| [[image:BEAMER_5.png|800px]]
|-  
|-  
| colspan="2" style="text-align: center;|
| colspan="1" style="text-align: center;|
Final result of the Chipplace node with relative doses from 1 to 2 and dose labels in place. Image: Thomas Pedersen.
Final result of the Chipplace node with relative doses from 1 to 2, ready for export to V30. Image: Thomas Pedersen.
|}
 
{| style="border: none; border-spacing: 0; margin: 1em auto; text-align: center;"
|-
| [[image:BEAMER_6.png|800px]]
|-
| colspan="1" style="text-align: center;|
Example of the added dose labels. Image: Thomas Pedersen.
|}
|}
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