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Specific Process Knowledge/Lithography/EBeamLithography/BEAMER: Difference between revisions

Thope (talk | contribs)
Thope (talk | contribs)
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{| style="border: none; border-spacing: 0; margin: 1em auto; text-align: center;"
{| style="border: none; border-spacing: 0; margin: 1em auto; text-align: center;"
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| [[image:BEAMER_1.png|600px]] || [[image:BEAMER_2.png|600px]]
| [[image:BEAMER_1.png|600px]]  
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| colspan="2" style="text-align: center;|
| colspan="1" style="text-align: center;|
Import a design and add the Chipplace node. In Chipplace choose a substrate size to visualize placement within the substrate. Image: Thomas Pedersen.
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{| style="border: none; border-spacing: 0; margin: 1em auto; text-align: center;"
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| [[image:BEAMER_2.png|600px]]
|-
| colspan="1" style="text-align: center;|
Import a design and add the Chipplace node. In Chipplace choose a substrate size to visualize placement within the substrate. Image: Thomas Pedersen.
Import a design and add the Chipplace node. In Chipplace choose a substrate size to visualize placement within the substrate. Image: Thomas Pedersen.
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|}