Specific Process Knowledge/Lithography/EBeamLithography/BEAMER: Difference between revisions
Appearance
| Line 190: | Line 190: | ||
{| style="border: none; border-spacing: 0; margin: 1em auto; text-align: center;" | {| style="border: none; border-spacing: 0; margin: 1em auto; text-align: center;" | ||
|- | |- | ||
| [[image:BEAMER_1 | | [[image:BEAMER_1.png|600px]] | ||
|- | |- | ||
| colspan=" | | colspan="1" style="text-align: center;| | ||
Import a design and add the Chipplace node. In Chipplace choose a substrate size to visualize placement within the substrate. Image: Thomas Pedersen. | |||
|} | |||
{| style="border: none; border-spacing: 0; margin: 1em auto; text-align: center;" | |||
|- | |||
| [[image:BEAMER_2.png|600px]] | |||
|- | |||
| colspan="1" style="text-align: center;| | |||
Import a design and add the Chipplace node. In Chipplace choose a substrate size to visualize placement within the substrate. Image: Thomas Pedersen. | Import a design and add the Chipplace node. In Chipplace choose a substrate size to visualize placement within the substrate. Image: Thomas Pedersen. | ||
|} | |} | ||