Jump to content

Specific Process Knowledge/Lithography/EBeamLithography/FirstEBL: Difference between revisions

← Older editNewer edit →
VisualWikitext
Thope (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
2,179 edits
Thope (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
2,179 edits
Line 52: Line 52:
|-
|-
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
|'''[[Specific_Process_Knowledge/Lithography/CSAR|CSAR AR-P 6200]]'''
|'''[[Specific_Process_Knowledge/Lithography/CSAR|CSAR AR-P 6200.09]]'''
|Positive
|Positive
|[http://www.allresist.com AllResist]
|[http://www.allresist.com AllResist]
Line 86: Line 86:
|-
|-
|-style="background:LightGrey; color:black"
|-style="background:LightGrey; color:black"
|'''AR-N 7500'''
|'''AR-N 7500.18'''
|Negative
|Negative
|[http://www.allresist.com AllResist]
|[http://www.allresist.com AllResist]
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Lithography/EBeamLithography/FirstEBL"