Specific Process Knowledge/Lithography/EBeamLithography/FirstEBL: Difference between revisions
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**Set a reasonable x- and y-axis pitch in the '''Height data measurement pitch''' fields | **Set a reasonable x- and y-axis pitch in the '''Height data measurement pitch''' fields | ||
**Set '''Offset''' fields to zero | **Set '''Offset''' fields to zero | ||
*Click '''Save''' in order to save the setup for execution during exposure | |||
*Click '''Execute''' to execute and verify result | |||
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The pattern used in this example is very small and centred around (0,0). The example above will create a 3x3 matrix of height data with a pitch of 1 mm in x and y. | The pattern used in this example is very small and centred around (0,0). The example above will create a 3x3 matrix of height data with a pitch of 1 mm in x and y. After execution the system will display a matrix with height measurement data in µm. Verify that there are no outliers and that variation is less than 100 µm. | ||
=Development= | =Development= | ||