Specific Process Knowledge/Lithography/EBeamLithography/FirstEBL: Difference between revisions
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Parameters of the '''HEIMAP''' subprogram. Image: Thomas Pedersen. | Parameters of the '''HEIMAP''' subprogram used for the tutorial exposure. Image: Thomas Pedersen. | ||
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The pattern used in this example is very small and centred around (0,0). The example above will create a 3x3 matrix of height data with a pitch of 1 mm in x and y. | |||
=Development= | =Development= | ||