Specific Process Knowledge/Lithography/EBeamLithography/FirstEBL: Difference between revisions
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*Click '''Edit Parameter...''' | *Click '''Edit Parameter...''' | ||
*This opens the '''HEIMAP''' parameters window, make sure to edit the following parameters | *This opens the '''HEIMAP''' parameters window, make sure to edit the following parameters | ||
** | **Check '''Wafer''' and not '''Mask''' | ||
**Choose correct '''Material size''' in the dropdown | |||
**Choose the correct slot ID in '''Multi-piece window''' | |||
**Set a reasonable number in x and y '''Number of height measurement points''' | |||
**Set a reasonable x- and y-axis pitch in the '''Height data measurement pitch''' fields | |||
**Set '''Offset''' fields to zero | |||
{| style="border: none; border-spacing: 0; margin: 1em auto; text-align: center;" | {| style="border: none; border-spacing: 0; margin: 1em auto; text-align: center;" | ||