Specific Process Knowledge/Lithography/EBeamLithography/FirstEBL: Difference between revisions
| Line 433: | Line 433: | ||
| colspan="1" style="text-align:center;| | | colspan="1" style="text-align:center;| | ||
Example of beam offset matrix shown during auto calibration. Average beam offset is below 1 nm within the 1000 x 1000 µm<sup>2</sup> writing field in this example. Image: Thomas Pedersen. | Example of beam offset matrix shown during auto calibration. Average beam offset is below 1 nm within the 1000 x 1000 µm<sup>2</sup> writing field in this example. Image: Thomas Pedersen. | ||
|} | |||
==Measure stage drift== | |||
The next step is to measure stage drift. This is done from the '''Calibration''' window. | |||
*Select the '''Drift''' subprogram and click '''Execute''' | |||
The system will scan the drift mark (BE mark) to determine drift since last drift reset. The absolute value is not important since it is unknown when the drift subprogram was last reset. The time variation of the drift measurements is however important thus one should compare two drift measurements taken 1-2 minutes apart. Luckily the '''dayli''' batch command ended with a drift measurement, having made one manually we can now compare the result, see the example below. | |||
{| style="border: none; border-spacing: 0; margin: 1em auto; text-align: center;" | |||
|- | |||
| [[image:9500drift1.png|600px]] | |||
|- | |||
| colspan="1" style="text-align:center;| | |||
Bla. Image: Thomas Pedersen. | |||
|} | |} | ||