Specific Process Knowledge/Lithography/EBeamLithography/FirstEBL: Difference between revisions
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The SDF specifies which system condition file to use for the exposure, this determines the beam current. In this tutorial the chosen condition file is '''6nA_ap5'''. Thus we restore the system and cloumn to this condition file. This is done from the '''Calib''' window, if it is not open it can be opened from the '''EBX Menu'''. | The SDF specifies which system condition file to use for the exposure, this determines the beam current. In this tutorial the chosen condition file is '''6nA_ap5'''. Thus we restore the system and cloumn to this condition file. This is done from the '''Calib''' window, if it is not open it can be opened from the '''EBX Menu'''. | ||
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2", 4" and 6" substrates can be coated with AR-P6200.09 (CSAR) on Spin Coater: Gamma E-beam & UV. Photo: Thomas Pedersen. | |||
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=Development= | =Development= | ||