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Specific Process Knowledge/Lithography/EBeamLithography/FirstEBL: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
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Thope (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
2,224 edits
Line 349: Line 349:
**Execute absorbed electron mark detection
**Execute absorbed electron mark detection
**Execute backscatter electron mark detection
**Execute backscatter electron mark detection
*Execute self calibration routine
*Execute self calibration routine '''daily'''
**Execute '''daily''' optimization routine
*Verify drift is low
*Verify drift is low
*Map height profile of sample
*Map height profile of sample
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