Specific Process Knowledge/Lithography/Resist/UVresist: Difference between revisions
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===Aligner: Maskless 02=== | ===Aligner: Maskless 02=== | ||
The Aligner: Maskless 02 has a 375 nm laser light source, and a 405 nm laser light source, each with a FWHM of ~1 nm. | <!-- The Aligner: Maskless 02 has a 375 nm laser light source, and a 405 nm laser light source, each with a FWHM of ~1 nm. --> | ||
The Aligner: Maskless 02 has a 375 nm laser light source with a FWHM of ~1 nm. | |||
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