Jump to content

Specific Process Knowledge/Lithography/EBeamLithography/Cassettes: Difference between revisions

← Older editNewer edit →
VisualWikitext
Thope (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
2,179 edits
Thope (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
2,179 edits
Line 31: Line 31:
! Wafer size !! ID !! Slot ID !! Material !! Image
! Wafer size !! ID !! Slot ID !! Material !! Image
|-
|-
| 4" || BSPCL-520 || 4A, 4B, 4C || Ti ||  
| 4" || BSPCL-520 || 4A, 4B, 4C || Ti || [[image:BSPCL-520.png|200px]]
|-
|-
| Example || Example || Example || Example || Example
| Example || Example || Example || Example || Example
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Lithography/EBeamLithography/Cassettes"