Specific Process Knowledge/Lithography/EBeamLithography/FirstEBL: Difference between revisions

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-[[File:DoseArray.png|1000px|center|frameless]]
+{| style="border: none; border-spacing: 0; margin: 1em auto; text-align: center;"
+|-
+| [[image:DoseArray.png|1000px]]
+|-
+| colspan="1" style="text-align:center;|
+Resulting setup from the example job. The pattern (DTU logo) is instanced 10 times with a pitch of 50 µm. The dose is modulated between 200 and 290 µC/cm<sup>2</sup>.
+|}