Specific Process Knowledge/Lithography/EBeamLithography/FirstEBL: Difference between revisions
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[[File:TPE02755.jpg|center|517px|thumb|Full automatic Gamma UV + E-beam spin coater. Photo: Thomas Pedersen]] <br> | [[File:TPE02755.jpg|center|517px|thumb|Full automatic Gamma UV + E-beam spin coater. Photo: Thomas Pedersen]] <br> | ||
[[File:TPE02755.jpg|center|517px|Full automatic Gamma UV + E-beam spin coater. Photo: Thomas Pedersen]] <br> | |||
=Pattern preparation= | =Pattern preparation= | ||