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Specific Process Knowledge/Lithography/EBeamLithography/FirstEBL: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
2,186 edits
Thope (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
2,186 edits
Line 177: Line 177:
LAYER  1                                      Definition of pseudo layer 1
LAYER  1                                      Definition of pseudo layer 1


P(1)  'dtu_logo_8mu.v30'                      Assignment of P(1) to V30 file
P(1)  'dtu_logo_um.v30'                      Assignment of P(1) to V30 file
SPPRM 4.0,,,,1.0,1                            Beam parameters
SPPRM 4.0,,,,1.0,1                            Beam parameters
STDCUR  2.2 ;nA                              Beam current + 10% overhead
STDCUR  2.2 ;nA                              Beam current + 10% overhead
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