Specific Process Knowledge/Lithography/EBeamLithography/FirstEBL: Difference between revisions
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The example provided here demonstrates one way to set up a dose test of a particular pattern on a blank 4" silicon wafer. Dose testing is often necessary to obtain the desired critical dimension and it is vital to be able to set up such a job in an efficient manner. In this example we set up the dose variation/modulation by manually writing a short modulation table. For more complex dose tests or dose test of proximity corrected patterns one should consider using the Chipplace module found in Beamer. | The example provided here demonstrates one way to set up a dose test of a particular pattern on a blank 4" silicon wafer. Dose testing is often necessary to obtain the desired critical dimension and it is vital to be able to set up such a job in an efficient manner. In this example we set up the dose variation/modulation by manually writing a short modulation table. For more complex dose tests or dose test of proximity corrected patterns one should consider using the Chipplace module found in Beamer. | ||
The pattern used in this example is a DTU logo | The pattern used in this example is a DTU logo. | ||
==JEOL 9500 example workflow== | ==JEOL 9500 example workflow== | ||