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Specific Process Knowledge/Lithography/EBeamLithography/FirstEBL: Difference between revisions

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Thope (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
2,179 edits
Line 164: Line 164:
   
   
PATH  DRF5M                                  Cyclic calibration definition
PATH  DRF5M                                  Cyclic calibration definition
   ARRAY      (0,10,50)/(0,1,0)               10-1 array around (0,0) with 50 µm pitch in x-axis
   ARRAY      (100,10,50)/(100,1,0)           10-1 array around (100,100) with 50 µm pitch in x-axis
     ASSIGN P(1)->((1,1),SHOT1)                Pattern and modulation assignment to each array element
     ASSIGN P(1)->((1,1),SHOT1)                Pattern and modulation assignment to each array element
     ASSIGN P(1)->((2,1),SHOT2)
     ASSIGN P(1)->((2,1),SHOT2)
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