Specific Process Knowledge/Lithography/EBeamLithography/FirstEBL: Difference between revisions

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 =Pattern preparation=
-In order to expose a pattern it must be converted to V30 format (JEOL52 V3.0) using Beamer. Beamer can read several different file formants, we recommend to using GDS as your input format.
+In order to expose a pattern it must be converted to V30 format (JEOL52 V3.0) using Beamer. Beamer can read several different file formants, we recommend using GDS as your input format. Beamer can do a lot of different operations on a pattern to better optimise it for writing. In this guide we will skip all of these operations and simply export the GDS pattern to a V30 file. For more advanced functionality and pattern preparation please refer to our Beamer pattern preparation guide.
+Beamer uses a node based system where each node performs an action on the pattern. In this simple example we will just have an import node to import our GDS file and connect it to an export node to output it as V30. The setup is thus as simple as can be and will look like below.
 [[File:BEAMER_lJDTeECL5G.png|800px|center|frameless]]
+Each node has several options and these can be changed by double clicking the node. For the export node we will need to choose the correct machine in "Machine Type"
-It is recommended to
-Users will typically have their pattern in either CIF or GDS format. The JEOL 9500 system can only expose patterns defined in the v30 format and thus as a minimum the pattern must be translated to v30. This can be done with Beamer from Genisys. In this example job we will also show how to apply a Proximity Effect Correction (PEC) to the pattern, this is also done in Beamer.
 [[File:BEAMER_setup.png|800px|center|frameless]]