Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide: Difference between revisions
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|Sputter deposition: can be done on top of a large range of materials | |Sputter deposition: can be done on top of a large range of materials | ||
|Sputter deposition: can be done on top of a large range of materials. | |Sputter deposition: can be done on top of a large range of materials. | ||
| Wet SiO2 growth using hot HNO3. Done in fume hood 1 or 2 in D-3 | | Wet SiO2 growth using hot HNO3. Done in fume hood 1 or 2 in D-3. Training and risk assessment always needed | ||
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