Specific Process Knowledge/Lithography/EBeamLithography/FirstEBL: Difference between revisions
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=Pattern preparation= | =Pattern preparation= | ||
In order to expose a pattern it must be converted to V30 format (JEOL52 V3.0) using Beamer. Beamer can read several different file formants, we recommend to using GDS as your input format. | In order to expose a pattern it must be converted to V30 format (JEOL52 V3.0) using Beamer. Beamer can read several different file formants, we recommend to using GDS as your input format. | ||
[[File:BEAMER_lJDTeECL5G.png|800px|center|frameless]] | |||