Specific Process Knowledge/Lithography/EBeamLithography/FirstEBL: Difference between revisions
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Training on the JEOL 9500 system can be requested by sending a mail to [mailto:e-beam@nanolab.dtu.dk e-beam@nanolab.dtu.dk]. Please attach a process flow and any other relevant information for your process. Be advised that the booking calendar on the JEOL 9500 system is always very full, typically a user can expect the first training session about four weeks after the initial request. | Training on the JEOL 9500 system can be requested by sending a mail to [mailto:e-beam@nanolab.dtu.dk e-beam@nanolab.dtu.dk]. Please attach a process flow and any other relevant information for your process. Be advised that the booking calendar on the JEOL 9500 system is always very full, typically a user can expect the first training session about four weeks after the initial request. | ||
== | ==JEOL 9500 workflow== | ||
The general workflow of E-beam lithography on the JEOL 9500 system is summarized below and explained in detail in the subsequent sections. In order to optimize usage of the system steps 1 to 6 must all be done ahead of the booked session on the 9500 system. | The general workflow of E-beam lithography on the JEOL 9500 system is summarized below and explained in detail in the subsequent sections. In order to optimize usage of the system steps 1 to 6 must all be done ahead of the booked session on the 9500 system. | ||