Specific Process Knowledge/Lithography/EBeamLithography/FirstEBL: Difference between revisions
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DTU Nanolab provides the following standard EBL resists. | DTU Nanolab provides the following standard EBL resists. | ||
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!colspan="11" border="none" style="background:silver; color:black;" align="center"|DTU Nanolab supplied standard EBL resists and process guides | |||
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|'''Resist''' | |||
|'''Polarity''' | |||
|'''Manufacturer''' | |||
|'''Comments''' | |||
|'''Technical reports''' | |||
|'''Spin Coater''' | |||
|'''Thinner''' | |||
|'''Developer''' | |||
|'''Rinse''' | |||
|'''Remover''' | |||
|'''Process flows (in docx-format)''' | |||
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|-style="background:WhiteSmoke; color:black" | |||
|'''[[Specific_Process_Knowledge/Lithography/CSAR|CSAR AR-P 6200]]''' | |||
|Positive | |||
|[http://www.allresist.com AllResist] | |||
|Standard positive resist, very similar to ZEP520. | |||
|[https://www.allresist.com/wp-content/uploads/sites/2/2020/03/AR-P6200_CSAR62english_Allresist_product-information.pdf AR-P 6200 info] | |||
|[[Specific_Process_Knowledge/Lithography/Coaters#Spin Coater: Gamma E-beam and UV|Spin Coater: Gamma E-beam and UV]] or [[Specific_Process_Knowledge/Lithography/Coaters#Manual_Spin_Coaters|Spin Coater: LabSpin 02/03]] | |||
|Anisole | |||
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*AR-600-546 | |||
*AR-600-548 | |||
*N50 | |||
*MIBK:IPA | |||
|IPA | |||
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*AR-600-71 | |||
*Remover 1165 | |||
|[[media:Process_Flow_CSAR.docx|CSAR]] <br> [[media:Process Flow CSAR with Al.docx|CSAR with Al]] <br> [[media:Process_Flow_LOR5A_CSAR_Developer_TMAH_Manual.docx|LOR5A with CSAR]] <br> | |||
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|-style="background:LightGrey; color:black" | |||
|'''[[Specific_Process_Knowledge/Lithography/ARN8200|Medusa AR-N 8200]]''' | |||
|Negative | |||
|[http://www.allresist.com AllResist] | |||
|Both e-beam and DUV sensitive resist. | |||
|[https://www.allresist.com/wp-content/uploads/sites/2/2020/03/SXAR-N8200-1_english_Allresist_product_information.pdf AR-N 8200 info] | |||
|[[Specific_Process_Knowledge/Lithography/Coaters#Manual_Spin_Coaters|Spin Coater: LabSpin 02/03]] | |||
|AR 600-07 | |||
|AR 300-47:DIW (1:1) | |||
|DIW | |||
|BOE | |||
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|-style="background:LightGrey; color:black" | |||
|'''AR-N 7500''' | |||
|Negative | |||
|[http://www.allresist.com AllResist] | |||
|Both e-beam, DUV and UV-sensitive resist. | |||
|[https://www.allresist.com/wp-content/uploads/sites/2/2020/03/AR-N7500_english_Allresist_product-information.pdf AR-N 7500 info] | |||
|[[Specific_Process_Knowledge/Lithography/Coaters#Manual_Spin_Coaters|Spin Coater: LabSpin 02/03]] | |||
|PGMEA | |||
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*AR 300-47:DIW (4:1) | |||
*MIF726:DIW (8:5) | |||
|DIW | |||
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*AR 300-73 | |||
*O2 plasma | |||
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