Specific Process Knowledge/Lithography/EBeamLithography/FirstEBL: Difference between revisions
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==General workflow== | ==General workflow== | ||
The general workflow of E-beam lithography on the JEOL 9500 system is summarized below. In order to optimize usage of the system steps 1 to 6 | The general workflow of E-beam lithography on the JEOL 9500 system is summarized below and explained in detail in the subsequent sections. In order to optimize usage of the system steps 1 to 6 must all be done ahead of the booked session on the 9500 system. | ||
#Resist coating and baking | #Resist coating and baking | ||