Specific Process Knowledge/Lithography/EBeamLithography/FirstEBL: Difference between revisions
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=My First JEOL 9500 Exposure Guide= | =My First JEOL 9500 Exposure Guide= | ||
The JEOL 9500 E-beam writer offers world class performance, this however comes at a price of a fairly steep learning curve. This page is specifically intended to guide new users through their very first exposure on the system. In this guide we will set up a simple wafer/chip exposure using a single beam current and without pattern alignment. The complexity of this job is kept at | The JEOL 9500 E-beam writer offers world class performance, this however comes at a price of a fairly steep learning curve. This page is specifically intended to guide new users through their very first exposure on the system. In this guide we will set up a simple wafer/chip exposure using a single beam current and without pattern alignment. The complexity of this job is kept at a very low level and we encourage new users to make sure their first job (first training session) matches this complexity level. More complex jobs can be run when a user is more familiar with the system. | ||
Training on the JEOL 9500 system can be requested by sending a mail to [mailto:e-beam@nanolab.dtu.dk e-beam@nanolab.dtu.dk]. Please attach a process flow and any other relevant information for your process. Be advised that the booking calendar on the JEOL 9500 system is always very full, typically a user can expect the first training session about four weeks after the initial request. | Training on the JEOL 9500 system can be requested by sending a mail to [mailto:e-beam@nanolab.dtu.dk e-beam@nanolab.dtu.dk]. Please attach a process flow and any other relevant information for your process. Be advised that the booking calendar on the JEOL 9500 system is always very full, typically a user can expect the first training session about four weeks after the initial request. | ||