Specific Process Knowledge/Etch/III-V ICP: Difference between revisions
No edit summary |
mNo edit summary |
||
| Line 1: | Line 1: | ||
{{cc-nanolab}} | |||
'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Etch/III-V_ICP click here]''' | '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Etch/III-V_ICP click here]''' | ||
<br> | <br> | ||
[[Image:III-VICP.jpg |300x300px|thumb|The SPTS III/V ICP in the DTU Nanolab cleanroom B-1]] | [[Image:III-VICP.jpg |300x300px|thumb|The SPTS III/V ICP in the DTU Nanolab cleanroom B-1]] | ||