Specific Process Knowledge/Etch/Wet III-V Etches: Difference between revisions
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BHF etches SiO<sub>2</sub> and partially removes native oxide on InGaAs and InP. '''Do not use BHF unless you know the dangers involved with this chemical and always use 4H gloves!'''. | BHF etches SiO<sub>2</sub> and partially removes native oxide on InGaAs and InP. '''Do not use BHF unless you know the dangers involved with this chemical and always use 4H gloves!'''. | ||
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'''(5)''' Appl. Phys. Lett. vol. 51, 2222 (1987). | '''(5)''' Appl. Phys. Lett. vol. 51, 2222 (1987). | ||
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<br>'''Note:''' neither Physimeca or PECVD2 is available anymore. Use the Temescal and the PECVD3/PECVD4 instead. | <br>'''Note:''' neither Physimeca or PECVD2 is available anymore. Use the Temescal and the PECVD3/PECVD4 instead. | ||
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==Citric Acid etch== | ==Citric Acid etch== | ||