Jump to content

Specific Process Knowledge/Thermal Process/Oxidation/Standard oxidation recipes: Difference between revisions

Paphol (talk | contribs)
No edit summary
Paphol (talk | contribs)
No edit summary
Line 1: Line 1:
'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thermal_Process/Oxidation/Standard_oxidation_recipes click here]'''
'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?
 
''This page is written by DTU Nanolab  internal''
 
Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thermal_Process/Oxidation/Standard_oxidation_recipes click here]'''


=<span style="background:#FF2800">THIS PAGE IS UNDER CONSTRUCTION</span>=
=<span style="background:#FF2800">THIS PAGE IS UNDER CONSTRUCTION</span>=
''This page is written by DTU Nanolab  internal''
 


The oxidation furnaces in the cleanroom are being used for dry and wet oxidation of silicon wafers.  
The oxidation furnaces in the cleanroom are being used for dry and wet oxidation of silicon wafers.