Specific Process Knowledge/Etch/IBE⁄IBSD Ionfab 300/SIMS settings: Difference between revisions
Appearance
No edit summary |
No edit summary |
||
| Line 5: | Line 5: | ||
|- | |- | ||
|colspan="3" style="text-align: center;" style="background:Black; color:White;" | '''SIMS | |colspan="3" style="text-align: center;" style="background:Black; color:White;" | '''SIMS settings for different materials''' | ||
|- | |- | ||
Latest revision as of 10:33, 4 September 2025
Feedback to this page: click here
The content on this page, including all images and pictures, was created by Berit Herstrøm @ DTU Nanolab (BGHE), unless otherwise stated. - 2015
| SIMS settings for different materials | ||
| Lower plate | Upper plate | |
|---|---|---|
| Ti | -1 | |
| Si | -1 | (2) |
| Al | -1 | 1 |
| Cr | -1 | |
| Ni | -6 | |